| 摘要 |
PURPOSE:To accurately control the composition of a grown layer and to repeatedly use a melt many times by forcing out the melt for growth from one of a pair of melt vessels having a flowing hole to the other to cover a substrate for growth and by wiping the excess melt from the substrate. CONSTITUTION:Each of a plurality of melt reservoirs 8 constituting a slider 1 sliding in the arrow direction on a susceptor 2 holding a substrate 6 for growth is composed of a pair of melt vessels 10, 11. When a piston 4 is pushed down by a gate 5, a melt 3 for growth in the vessel 10 is forced out to the vessel 11 through a melt flowing hole 9 to cover the substrate 6. After finishing liq. phase growth, by moving the slider 1, the melt 3 on the substrate 6 is wiped away by the piston 4 or the partition wall of the reservoir 8 and stored in the reservoir 8. Thus, the mixing of the melt on the substrate 6 with the melt for growth in the reservoir 8 is avoided. |
