| 摘要 |
PURPOSE:To prevent trouble due to the formation of scum and water insoluble matter without exerting unfavorable influence especially on the photographic characteristics of a photosensitive silver halide material contg. an anionic surfactant by adding a specified antistatic agent to >=1 constituent layer of the material. CONSTITUTION:To >=1 constituent layer of a sensitive material, especially to the protective layer is added an antistatic agent represented by formulaI[where R is 3-20C (un)satd. hydrocarbon, each of L1 and L2 is a bivalent combining group, L1 is a group represented by formula II, III or IV, L2 is -(CH2)p- or a group represented by formula V (p is 1-4), each of R1-R9 is H, CH3, C2H5 or C3H7, A is -COO or -SO3, each of a, b, d and e is 0, 1 or 2, a=bnot equal to 0, e=dnot equal to 0, and R10 is H or 1-12C (un)satd. hydrocarbon]. Thus, a sensitive material preventing the occurrence of static marks, etc. and capable of being automatically developed at high speed without exerting unfavorable influence on the fog, sensitivity, etc. is obtd.
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