发明名称 MANUFACTURING DEVICE OF AMORPHOUS SEMICONDUCTOR FILM
摘要 PURPOSE:To acquire an amorphous semiconductor film which is suitable for a solar cell, a thin-film transistor, an image pickup device and so forth, and excellent in quality, by providing a porous electrode and a porous electrode heater through an insulator. CONSTITUTION:An insulator of silicon oxide, titan oxide, magnesium oxide or the like is laid between a porous electrode 31 for high frequency application and a resistace line heater 33 of nichrome, tungsten or the like to heat the electrode 31. An amorphous semiconductor thin-film is made after discharging in such electrode. It is improved in optical conductivity and quality.
申请公布号 JPS57210623(A) 申请公布日期 1982.12.24
申请号 JP19810004846 申请日期 1981.01.16
申请人 SUWA SEIKOSHA KK 发明人 KURIHARA HAJIME
分类号 H01L21/205;H01L31/04 主分类号 H01L21/205
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