发明名称 |
BEAM SCANNING USING RADIATION PATTERN DISTORTION |
摘要 |
<p>BEAM SCANNING USING RADIATION PATTERN DISTORTION A laser beam scanner in which a single-lobe propogates radiation pattern through an electrically variable asymmetric electrical charge distribution. Because the electrical charge distribution determines the real and imaginary parts of the refractive index of the material through which the radiation pattern propogates the radiation pattern may be deflected by changing the charge distribution profile.</p> |
申请公布号 |
CA1132695(A) |
申请公布日期 |
1982.09.28 |
申请号 |
CA19790328067 |
申请日期 |
1979.05.22 |
申请人 |
XEROX CORPORATION |
发明人 |
SCIFRES, DONALD R.;STREIFER, WILLIAM;BURNHAM, ROBERT D. |
分类号 |
G02F1/015;G02F1/29;G02F1/295;H01S5/00;H01S5/06;H01S5/062;(IPC1-7):02F1/00 |
主分类号 |
G02F1/015 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|