发明名称 BEAM SCANNING USING RADIATION PATTERN DISTORTION
摘要 <p>BEAM SCANNING USING RADIATION PATTERN DISTORTION A laser beam scanner in which a single-lobe propogates radiation pattern through an electrically variable asymmetric electrical charge distribution. Because the electrical charge distribution determines the real and imaginary parts of the refractive index of the material through which the radiation pattern propogates the radiation pattern may be deflected by changing the charge distribution profile.</p>
申请公布号 CA1132695(A) 申请公布日期 1982.09.28
申请号 CA19790328067 申请日期 1979.05.22
申请人 XEROX CORPORATION 发明人 SCIFRES, DONALD R.;STREIFER, WILLIAM;BURNHAM, ROBERT D.
分类号 G02F1/015;G02F1/29;G02F1/295;H01S5/00;H01S5/06;H01S5/062;(IPC1-7):02F1/00 主分类号 G02F1/015
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