| 摘要 |
PURPOSE:To inhibit generation of an inferior vacuum-evaporated part, by locating a plurality of metal-discharging parts inside a vacuum evaporator, and injecting molten evaporating metal particles from each meral-discharging part to a workpiece with different angles. CONSTITUTION:Metal-discharging parts 18, 19 are located at the same height inside a vacuum evaporator. The center of one discharging part 19 is set consistent with the center line l of the revolution of a wafer-supporting body 17, while the center of the other discharging part 18 is set eccentrically in a distance d apart from the center line l. The supporting body 17 holding a wafer 1 is rotated and recolved, and metal particles 31 are discharged toward the wafer 1 by operation of one dischaging part 19, for instance, at first. After the passage of a fixed period, the operation of the discharging part 19 is stopped, while operation of the other discharging part 18 is started to discharge metal particles 30 toward the wafer 1. In this way, metal particles 30, 31 are discharged with different injection angles so that generation of an inferior vacuum-evaprorated part such as broken vranches on the wafer 1 can be inhibited. |
