| 摘要 |
PURPOSE:To make an estimate of the yield of semiconductor devices possible and simultaneously maintain the optimum evaporating condition by measuring fine particles which are sticked and generated during the evaporation. CONSTITUTION:A means by which fine particles which exist in a reaction space over the specimen and cause abnormal discharge are detected optically is provided. For instance, in a sputtering device, parallel light beam 22 makes fine particles 24 in a reaction space generate scattered light 25 which is detected by a detector 27. The scattered light 25 is detected as pulse and the height of the pulse corresponds to the size of the fine particle 24. So, the number of the fine particles 24 can be measured by recording and indicating the pulse signal by a recorder 29. As the amplitude of the pulse signal corresponds to the size of the fine particle 24, average particle diameter can be classified by determining the amplitude level. |
