首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PROCESS FOR PREPARING ISOMERS OF THE COMPOUND N,N-BIS-^(1-FORMAMIDO-2,2,2-TRICHLORO)ETHYL[-PIPERAZINE
摘要
申请公布号
YU31574(A)
申请公布日期
1982.06.30
申请号
YU19740000315
申请日期
1974.02.07
申请人
CELAMERCK GMBH & CO.KG..
发明人
OST W.;THOMAS K.;AMADORI E.;DARSKUS R.
分类号
A01N43/60;A01P3/00;C07D295/12;(IPC1-7):C07D241/04;A01N9/22
主分类号
A01N43/60
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Composite High-K Metal Gate Stack for Enhancement Mode GaN Semiconductor Devices
METAL OXIDE SEMICONDUCTOR HAVING EPITAXIAL SOURCE DRAIN REGIONS AND A METHOD OF MANUFACTURING SAME USING DUMMY GATE PROCESS
ORGANIC LIGHT EMITTING DIODE DISPLAY
SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS
SOLID-STATE IMAGING DEVICE
SOLID-STATE IMAGING ELEMENT AND ELECTRONIC DEVICE
FABRICATION METHOD OF SEMICONDUCTOR PACKAGE
LED Packaging Structure
Semiconductor chip and method of processing a semiconductor chip
SEMICONDUCTOR DIE AND DIE CUTTING METHOD
METHOD OF INSPECTING SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
TRANSISTOR, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
SUPPORT ASSEMBLY FOR SUBSTRATE BACKSIDE DISCOLORATION CONTROL
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH)
POLISHING COMPOSITION
INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION
GATE STACK MATERIALS FOR SEMICONDUCTOR APPLICATIONS FOR LITHOGRAPHIC OVERLAY IMPROVEMENT
METHOD AND ION IMPLANTER FOR LOW TEMPERATURE IMPLANTATION