Dry etching device and method.

摘要

A dry etching method and device involve induction of a magnetic field having field lines perpendicular to an electric field by magnets (28a, 28b, 28c) which are arranged in the vicinity of a cathode (21) within a reaction chamber, on the surface of the cathode (21) being placed a sample (30) to be etched by a plasma of an etchant gas.