| 摘要 |
PURPOSE:To enable to expose and print a minute pattern, by a method wherein a wafer is absorbed to the surface of a flexible chuck and the wafer in a state of convex lens is flattened by making the pressure of liquid to work followed by exposing. CONSTITUTION:A wafer 4 comes in contact with the flexible chuck surface 33, peripheral ring 41 and the tip of the projection 42 and traces the chuck surface when exhausted from a hole 37. Flatness of the wafer upper surface is detected 17 and operated to regulate the up and down movement of a vertical shaft 34 and the chuck surface 33 by controlling a barometric control device 18. According to said constitution, the wafer having usually undulation and warp of about 100mum owing to the undergone heat treatments of various kinds can be improved to the extent of flatness + or -1mum thus enabling to expose and print a minute pattern of 1-2mum. |
