| 摘要 |
PURPOSE:To obtain a micropattern by forming the second resist film on a window of the first resist film through oblique vaporization and regulating the second window. CONSTITUTION:The second resist 3 is obliquely evaporized in an opening 10 of the first resist film having a thickness of approximately one micron. The thickness of the second regist is approximately 1,000 Angstrom thick. The regist 3 is also formed in the opening 10 so that a small hole 5 regulated by the resists 2 and 3. This small hole 5, if used for patterning the etching of a ground substrate, can form a micropattern. |
