| 摘要 |
<p>PURPOSE:To improve the working efficiency of a device by displaying main scales or subscale verniers for checking the distortion of respective product reticles. CONSTITUTION:At least one main scale, a main vernier 13 including a subscale vernier or the sub-scale vernier 14 is displayed on a prescribed sectioned position other than respective product patterns 15, 16 in each of product reticles 11a, 11b to be successively applied to a contracted projecting exposure device in a photoengraving process at the time of producting a semiconductor device. Thereby, it is unnecessary to stop the device for every measurement of a distortion variable, replacing the current reticle by a reticle dedicated to distortion measurement and to check the presence and absence of adhesion of foreign matters on the product reticle. Consequently, the working efficiency of the device can be improved.</p> |
