发明名称 Planar indium antimonide diode array and method of manufacture
摘要 An improved diode array and method of manufacture is provided by the diffusion of cadmium from an indium-cadmium alloy through a silicon diode mask into bulk indium-antimonide to form a planar structure.
申请公布号 US4286277(A) 申请公布日期 1981.08.25
申请号 US19770854435 申请日期 1977.11.22
申请人 THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY 发明人 LONGSHORE, RANDOLPH E.
分类号 H01L21/383;H01L21/465;H01L31/0304;H01L31/103;H01L31/18;(IPC1-7):H01L27/14 主分类号 H01L21/383
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