PHOTOSENSITIVE COMPOSITION

摘要

PURPOSE:To form a film with high surface strength and high resistance to an etching soln. by adding a reaction product of a specified cellulose ether and an anhydrous aromatic polybasic carboxylic acid to a photosensitive resin component. CONSTITUTION:A cellulose ether compound such as hydroxypropylcellulose or hydroxypropylhydroxyethylcellulose represented by R<1>a, R<2>bA or R<3>cR<4>dR<5>eA is reacted with an anhydrous aromatic polybasic carboxylic acid such as tetrahydrophthalic anhydride to prepare a cellulose ether aromatic carboxylic acid ester compound. One or more kinds of such compounds are mixed with a resin component such as novolak resin by 5-40wt% to the total amount of the resulting photosensitive composition, and this mixture is dissolved in a suitable solvent and applied to a support.