| 摘要 |
PURPOSE:To easily discriminate a residual resist piece and an electrode pattern, by combining the light source for projecting the diffusible luminous flux and the light source for projecting the parallel luminous flux. CONSTITUTION:The first light source for projecting the diffusible luminous flux consists of a fluorescent lamp, and it is installed so that it is exactly opposed to the photoelectric conversion element 5. Also, the second light source for projecting the parallel luminous flux consists of a halogen lamp with a collimater 32, and it is installed so that the irradiation angle is shifted against the photoelectric conversion element 5. According to the light source of the diffusible luminous flux, almost same image pickup output can be obtained as to both the diffusible substance such as a resist, etc. and the nonelectrode (mask) formation part, but when the parallel luminous flux light source is installed so that the irradiation angle is shifted from the photoelectric conversion element, only the pickup output by the diffusible substance can be obtained, and therefore the residual resist piece can be discriminated easily by making said two light sources irradiate alternately. |
