| 摘要 |
PURPOSE:To prevent rubber from separation and to improve a close contact between a semiconductor substrate and a holding base by a method wherein a rubber sheet for vacuum suction of a rotary system photoresist processing system is mounted in a groove extending to an approaching direction of a rotation axis of a holding base. CONSTITUTION:A groove 8 is formed at a holding base 4 connected to a constant speed motor 5 and having a hole 6 for supplying a vacuum in the direction approaching to the rotation axis of the holding base as facing from the surface of the holding base 4 to the inner part in the system which paints or develops a photoresist, and then, a thin rubber plate sheet 3 is mounted in this groove 8 so as to suck a semiconductor substrate 2 with a vacuum force. With this, when processing is performed by dripping a chemical liquid for the processing use from a nozzle 1 to rotate the holding base, it can be that the rubber sheet 3 will not be out of place during rotation, a closely sticking force will be strong and damages of a semiconducter substrate 2 due to falling are eliminated. |
