发明名称 WERKWIJZE VOOR HET VERVAARDIGEN VAN EEN GEMETALLISEERDE FILM VAN DIELEKTRISCH MATERIAAL VOOR EEN CONDENSATOR- ELEMENT.
摘要 A process for providing a margin in a metallized resin film for a condenser element which is characterized by providing on a dielectric resinous layer a water-soluble coating layer having a pattern corresponding to a margin pattern, providing a metal deposition layer on the resinous layer including a coated part and a non-coated part and removing the water-soluble coating layer and the metal deposition layer thereon by washing with water. According to the process, a metallized resin film having an arbitrary margin pattern and a superior electrical property can be readily obtained, with completely eliminating any complexity of the procedure and disadvantage in conventional processes for providing a margin.
申请公布号 NL164992(C) 申请公布日期 1981.02.16
申请号 NL19740008614 申请日期 1974.06.26
申请人 OIKE & CO., LTD., KYOTO, JAPAN. 发明人
分类号 C23C14/04;H01G13/00;H01G13/06;(IPC1-7):H01G4/14 主分类号 C23C14/04
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