发明名称 |
WERKWIJZE VOOR HET VERVAARDIGEN VAN EEN GEMETALLISEERDE FILM VAN DIELEKTRISCH MATERIAAL VOOR EEN CONDENSATOR- ELEMENT. |
摘要 |
A process for providing a margin in a metallized resin film for a condenser element which is characterized by providing on a dielectric resinous layer a water-soluble coating layer having a pattern corresponding to a margin pattern, providing a metal deposition layer on the resinous layer including a coated part and a non-coated part and removing the water-soluble coating layer and the metal deposition layer thereon by washing with water. According to the process, a metallized resin film having an arbitrary margin pattern and a superior electrical property can be readily obtained, with completely eliminating any complexity of the procedure and disadvantage in conventional processes for providing a margin. |
申请公布号 |
NL164992(C) |
申请公布日期 |
1981.02.16 |
申请号 |
NL19740008614 |
申请日期 |
1974.06.26 |
申请人 |
OIKE & CO., LTD., KYOTO, JAPAN. |
发明人 |
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分类号 |
C23C14/04;H01G13/00;H01G13/06;(IPC1-7):H01G4/14 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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