| 摘要 |
PURPOSE:To prevent the rotatory deviation of a wafer by providing a rotation preventing mechanism so that a pressure welding mechanism, which pressure welds a wafer on a mask, and a wafer chuck do not make a rotation relatively. CONSTITUTION:A coil spring 24 is elastically installed between a flange section 23 of an up-and-down moving block 6 and a wafer chuck 4. A contact stress is generated relatively between the end section of the spring 24 and the chuck 4 or the flange section 23 of the block 6. When gas is blown into the chamber 9 of a spherical base and a wafer parallel extracting work is performed, the friction force caused by contact stress is working even when the chuck 4 is in rotatable condition against the block 6, and the chuck 4 does not rotate against the block 6. |
