发明名称 CONTACT EXPOSURE PATTERN TRANSCRIBING METHOD
摘要 PURPOSE:To enable the adjusting of flection of masks, by stacking a master mark to which a fixed pattern is mounted and a copy mask to be transcribed, and by each surrounding these surfaces by chambers that can be brought to positive pressure or negative pressure. CONSTITUTION:A master mask 12 to which a pattern is formed and a copy mask 13 that must transcribe the pattern are contacted in a main body drum portion 11 constituting a transcription device, and these masks are fast sticked by evacuating a portion between the masks by means of a vinyl tube 21 faced to the circumferential end portions of these masks. A pressure chamber 16 is produced betweem the mask 12 and a field lens 17 by inserting the field lens while biting the fringe into the drum portion 11 at the mask 12 side, and a pressure chamber 15 is yielded by fixing a glass plate 18 at the mask 13 side. If the drum portion is formed in this way and pressure is controlled by using tubes 22, 23 each opening into the chambers 15, 16, the amount of flection, which differs by every device, is adjusted remarkably easy.
申请公布号 JPS5556627(A) 申请公布日期 1980.04.25
申请号 JP19780128528 申请日期 1978.10.20
申请人 FUJITSU LTD 发明人 TOYOSHIMA EIJI
分类号 H01L21/027;H01L21/30 主分类号 H01L21/027
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