发明名称 PHOTOCONDUCTIVE MATERIAL
摘要 <p>A photoconductive material comprising an amorphous substance whose indispensable constituent elements are silicon, carbon and hydrogen is disclosed. The photoconductive material preferably has a structure expressed by [Si1-xCx]1-y[H]y where 0.02&lt;/=x&lt;/=0.3 and 0.02&lt;/=y&lt;/=0.3. Up to 40% of the carbon can be substituted by germanium. The peak of response can be established for light of any desired wavelength between approximately 5,600 A-4,500 A. This photoconductive material is particularly useful when applied to a light-sensitive film which is operated in the storage mode. The light-sensitive film includes the photoconductive material in a region in which pairs of free electrons and positive holes are created upon incidence of light.</p>
申请公布号 GB2024186(A) 申请公布日期 1980.01.09
申请号 GB19790022002 申请日期 1979.06.25
申请人 HITACHI LTD 发明人
分类号 C01B31/36;G03G5/043;G03G5/08;G03G5/082;H01L31/0248;H01L31/04;(IPC1-7):01B33/00 主分类号 C01B31/36
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