| 摘要 |
PURPOSE:To coat developer evenly over the entire main surface of treating objects by arraying plural injection orifices to a nozzle in one direction and letting a developing solution be injected therefrom and at the same time moving these in the direction perpendicular to the arraying axis of the injection orifices. CONSTITUTION:At the time of coating a developer to the object to be developed such as semiconductor wafer or other which has been coated with a photosensitive resin, the developer introduced into a nozzle 10 is trisected by slit form paths 15 and is injected through the three injection orifices 13a thru 13c which are linearly arrayed in one direction. The injection parts 14 of the developer are so arranged as to superpose on the wafer 1 and completely cover the diametral direction on the wafer 1. Further the nozzle 10 is oscillated about the fulcrum 15 in the direction perpendicular to the arraying direction of the injection parts via arm 17 by a control unit 16. The enables even coating over the entire main surface of the waver 1 to be performed and makes possible fine patterning. |
