发明名称 |
PHOTOMASK |
摘要 |
PURPOSE:To obtain a photomask which can drill the aperture in a high conformity with the mask pattern with no overexposure at the convexity even if a proper exposure is given to the concavity, by providing the transmission amount regulation thin film at the position corresponding to the prescribed region at the convexity area of the photo resist. |
申请公布号 |
JPS53136969(A) |
申请公布日期 |
1978.11.29 |
申请号 |
JP19770051414 |
申请日期 |
1977.05.04 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
KONDOU SHIYUUJI;TSUJI KAZUHIKO |
分类号 |
G03F1/00;G03F1/54;G03F7/20;H01L21/027;H01L21/302 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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