| 发明名称 |
INSPECTION METHOD FOR PATTERN |
| 摘要 |
PURPOSE:To evaluate the quality of a formed film, by forming a pattern by radiating electron beam and simultaneously monitoring the change in the current flown to the electron ray emission hardening type resist film. |
| 申请公布号 |
JPS53127267(A) |
申请公布日期 |
1978.11.07 |
| 申请号 |
JP19770042882 |
申请日期 |
1977.04.13 |
| 申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
KATOU TADAO;FUJIKAWA KIYOUICHIROU;KASHIWAGI TADASHI |
| 分类号 |
G01B15/00;H01L21/027;H01L21/302;H01L21/66 |
主分类号 |
G01B15/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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