发明名称 PRODUCTION OF PROTECTIVE FILM OF SEMICONDUCTOR ELEMENT SURFACE
摘要 PURPOSE:To avoid the positive charge electrification caused on the protective film by irradiating the low-speed electron shower onto the element surface which forming the protective film, and thus to prevent the deterioration of the characteristics for the element itself.
申请公布号 JPS53124076(A) 申请公布日期 1978.10.30
申请号 JP19760100614 申请日期 1976.08.25
申请人 HITACHI LTD 发明人 NISHIDA SUMIO;NAGASHIMA NAOYUKI;ENARI HIDEO;YOSHIMI TAKEO
分类号 C23C14/34;H01L21/31 主分类号 C23C14/34
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