ANLAGE ZUR VAKUUM-AUFLAGERUNG DURCH REAKTIVE KATHODENZERSTAEUBUNG AUF EINE GLASPLATTE.

摘要

Appts., for vacuum coating (esp. reactive cathodic sputter coating) a horizontal planar transparent substrate with a non-metallic layer (semiconductor, metal oxide or other metal cpd.), includes an evacuatable coating chamber, a substrate carrier or transport device, one or more cathodes supporting coating material above the substrate, and electrodes and/or shielding plates and/or screens located within the chamber. The novelty is that the parts or faces of the electrodes (8) and/or screens (10) and/or shielding plates (12) and/or other affected components within the chamber, which are exposed to the particle flux from the cathode(s), are provided with sharp ends and/or projections.