Radial flow reactor including glow discharge limiting shield
摘要
An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.
申请公布号
US4033287(A)
申请公布日期
1977.07.05
申请号
US19760651555
申请日期
1976.01.22
申请人
BELL TELEPHONE LABORATORIES, INCORPORATED
发明人
ALEXANDER, JR., FRANK BERNARD;CAPIO, CESAR DEDUYO;HAUSER, JR., VICTOR EMERALD;LEVINSTEIN, HYMAN JOSEPH;MOGAB, CYRIL JOSEPH;SINHA, ASHOK KUMAR;WAGNER, RICHARD SIEGFRIED