| 发明名称 |
VERFAHREN ZUR HERSTELLUNG EINER FOTOMASKE |
| 摘要 |
PURPOSE:The defective parts of metal film are completely eliminated as well as roughness of glass substrate of corrected plane is minimized with automated elimination and correction. |
| 申请公布号 |
DE2638474(A1) |
申请公布日期 |
1977.03.10 |
| 申请号 |
DE19762638474 |
申请日期 |
1976.08.26 |
| 申请人 |
HITACHI,LTD. |
发明人 |
HONGO,MIKIO;NAKABAYASHI,JUNICHI |
| 分类号 |
H01L21/027;B23K26/08;G03F1/00;G03F1/72;H05K3/00;H05K3/02;H05K3/22 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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