发明名称 STRUCTURE FOR AND METHOD OF STRENGTHENING CONTRAST OF ELECTRON BEAM ALIGNMENT MARK
摘要 High atomic number metals or compounds are used as electron beam registration alignment marks on low atomic number substrates; this combination produces enhanced secondary and backscattered electron video signals over topographical alignment marks of homogeneous materials. To augment the enhanced signal contrast, pairs of alignment marks are placed very close together (less than or equal to 3 micrometers), from which the gap between the pair produces the augmented, enhanced signal contrast. In particular, the backscattered electron signal is enhanced when detected with an energy sensitive collector such as a silicon diode detector.
申请公布号 JPS5220767(A) 申请公布日期 1977.02.16
申请号 JP19760092389 申请日期 1976.08.04
申请人 HUGHES AIRCRAFT CO 发明人 EDOWAADO DEII UORUFU;UARUTAA II PAAKINZU JIYUNIA
分类号 H01L21/027;H01J37/304;H01L23/544 主分类号 H01L21/027
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