| 摘要 |
<p>PROBLEM TO BE SOLVED: To produce a template mask which has a template structure pattern comprising a plurality of identical template structures each consisting of a set of at least one circular structure element in order to plot a pattern of a plurality of identical target structures onto a target substrate. SOLUTION: Starting from a primary mask substrate 11 having a primary structure pattern consisting of at least one circular structure element, the production of the template mask is performed in at least one plotting mask structuring step (b, c), wherein in each mask structuring step by means of a broad ion beam 31 of energetic radiation the mask is illuminated and a structure pattern on masks 11 and 12 are imaged on intermediate substrates 11a and 12a. A target substrate 14 is patterned by means of the template mask 13 having a final plotting pattern. The pattern image thus produced has a plurality of identical target structures 24.</p> |
