| 摘要 |
PURPOSE:To augment the efficiency of manufacture of a device by a method wherein the positions liable to halation are predicted by the shape of underneath step difference of the device and the thickness of the resist film and taking a countermeasure to avoid said positions or enlarge the pattern dimensions. CONSTITUTION:The dimension of a resist pattern due to halation is varied by the distance between reflecting light path made by the angle of underneath step difference of a device and a pattern. That is, when the angle of step difference is specified, if a pattern is very near the step difference, the pattern dimension is kept unchanged but if they are at a certain distance, the pattern dimension is abruptly decreased and then slowly increased to be kept in a specified dimension at the distance exceeding specified length. Consequently, the position and shape subjected to the halation can be predicted by geometrical calculation. Through these procedures, a device can be manufactured efficiently by forming a design avoiding any positions liable to the halation or enlarging the pattern in said positions. |
