METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE AND PHOTOSENSITIVE RESIN COMPOSITION USED TO THE SAME

摘要

A method for fabricating a thin film transistor substrate and a photosensitive resin composition used to the same are provided to reduce the manufacturing time by forming an insulation organic film pattern using a superior sensitivity about the light. A mask(200) comprises a light-shield pattern(202), on the transparent substrate(201) and the opening(203) formed between light-shield patterns. It is softened in the photoresist resin composition material of the part in which the light is irradiated through the opening and the photoresist resin composition material of the part is removed from the following developing process. Since the exposed organic insulating film(75) is developed as developer and it gets rid of the unnecessary part pattern is molded. The light of the ultraviolet light lamp is additionally exposed to the organic insulating film in which pattern is molded. It becomes the organic insulating film which addition is exposed with the midbake.