Method of processing substrate holder material as well as substrate holder processed by such method

摘要

A method is provided of processing substrate holder material for a substrate holder on which on a first side of said substrate holder a semiconductor substrate is to be placed for layered deposition of various semiconductor materials on the semiconductor substrate using induction heating. The method includes the operations of determining a first electrical resistivity at at least one measuring position on said substrate holder material, comparing said first electrical resistivity with a second reference electrical resistivity and adapting said substrate holder material in correspondence with said comparison. Also a substrate holder is provided which is processes by such a method.

主权项

1. A method of processing substrate holder material to reduce temperature differences in a substrate holder's horizontal plane when a semiconductor substrate is placed on the substrate holder for deposition of materials on the semiconductor substrate using induction heating of the substrate holder, the method comprising the operations of:
determining a set of electrical resistivity values at at least two measuring positions on said substrate holder material; comparing said set of electrical resistivity values with a reference electrical resistivity, wherein said reference electrical resistivity is determined from the set of electrical resistivity values; locally adapting said substrate holder material at at least one position thereof, wherein said locally adapting is performed in correspondence with said comparison to reduce the temperature differences in the substrate holder's horizontal plane in said deposition of materials.