NON-DEGRADABLE NOXIOUS GAS TREATMENT SYSTEM USING THE SAME PROCESS

摘要

The present invention relates to a flue gas treatment system for decomposing non-degradable waste gas included in flue gas which is generated in a process of manufacturing a semiconductor, a flat panel display (FPD), or a liquid crystal display (LCD). Provided is a non-degradable noxious gas treatment system comprising: a supply part via which non-degradable noxious gas is supplied; a pre-heating zone which increases decomposition reactivity of the noxious gas; an oxidizing agent introduction part via which an oxidizing agent is introduced in order to generate explosive gas and reaction by-product powders from the treatment target gas; an oxidizing agent reaction part; a plasma ignitor which is added to the oxidizing agent reaction part; a reactor which performs an actual decomposition reaction; a quenching part which decreases temperature of the treated gas; a pre-scrubber which collects by-products; a demister which removes dust; a decomposer which performs decomposition using both a catalyst and dielectric heating; and a post-scrubber. Also provided is a treatment method using the same.