发明名称 Two terminal resistive access devices and methods of formation thereof
摘要 In accordance with an embodiment of the present invention, a memory cell includes a two terminal access device disposed above a semiconductor substrate. The access device includes a two terminal resistive switching device having substantially zero retention. The two terminal resistive switching device has a low resistance state and a high resistance state. A memory device is disposed above the semiconductor substrate. The memory device is coupled to the access device.
申请公布号 US9373786(B1) 申请公布日期 2016.06.21
申请号 US201313748470 申请日期 2013.01.23
申请人 Adesto Technologies Corporation 发明人 Kamalanathan Deepak;Koushan Foroozan Sarah
分类号 H01L47/00;H01L45/00 主分类号 H01L47/00
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A switching device comprising: a memory device disposed over a substrate; and a two terminal access device disposed over the substrate and coupled to the memory device, the two terminal access device comprising a two terminal resistive switching device, wherein the two terminal resistive switching device comprises an active electrode layer,an inert electrode layer,a switching layer disposed between the active electrode layer and the inert electrode layer, anda tunneling layer disposed between the active electrode layer and the inert electrode layer.
地址 Sunnyvale CA US