发明名称 Lithographic apparatus and method.
摘要 A lithographic apparatus comprises an optical sensor (24), a movable body (20), a support, a deflector system (22), a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
申请公布号 NL2015027(A) 申请公布日期 2016.07.08
申请号 NL20152015027 申请日期 2015.06.25
申请人 ASML NETHERLANDS B.V. 发明人 GÜNES NAKIBOGLU;SUZANNE COSIJNS;FRANK JOHANNES JACOBUS VAN BOXTEL;ANNE QUIST;LUKASZ SOSNIAK;BERT VAN DER PASCH
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
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