发明名称 IMAGE FORMING METHOD
摘要 PURPOSE:To obtain an image having excellent resolution by placing a non- adhesive photosensitive resin layer between a protecting film and a photosensitive resin layer having normal adhesion. CONSTITUTION:A photoresist film is obtained in a way that the adhesive photosensitive resin layer (b) is provided on a polyester film (a), and the non-adhesive photosensitive resin layer (c) and a vinyl alcohol film (d) are laminated thereon in that order. First, the polyester film (a) is peeled off, the adhesive photosensitive resin layer (b) is overlapped so that it is brought into contact with a base, and pressed by a normal heating roll. Next, the vinyl alcohol-based resin film (d) is peeled off, and a pattern mask is adhered tightly in vacuum on the non- adhesive photosensitive resin layer (c), which is exposed with active beams such as ultraviolet rays through the pattern mask. Then, developer is sprayed or used to immerse it to simultaneously develop the non-adhesive photosensitive resin layer (c) and the adhesive photosensitive resin layer (b), thereby forming an image. Thus, the image having excellent resolution can be obtained.
申请公布号 JPH01221735(A) 申请公布日期 1989.09.05
申请号 JP19880048011 申请日期 1988.02.29
申请人 NIPPON SYNTHETIC CHEM IND CO LTD:THE 发明人 KIMURA KATSUMI;TAKADA HIROSHI
分类号 G03F7/095;G03F7/004;G03F7/09;G03F7/11;H05K3/00;H05K3/06 主分类号 G03F7/095
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