APPARATUS FOR RETURNING WAFER AND METHOD FOR RETURNING WAFER USING THEREOF

摘要

PURPOSE: An apparatus for returning a wafer and a method for returning a wafer using thereof are provided to prevent the surface of the wafer from being contaminated with particles by transporting wafers in the direction of facing each other by rotating a head in a vertical direction. CONSTITUTION: An apparatus for returning a wafer comprises: a number of tweezers(32); a head(30) arranged so as to be rotated in a vertical direction; a stepping motor(42) connected to a side center part of the head; and a stand(36) performing a reciprocation movement and supporting the stepping motor. A method for returning a wafer comprises the steps that the stand puts a tweezer between received wafers; the stand starts to retreat backward as soon as the tweezer absorbs the corresponding wafer with a vacuum; the head guides the wafer by being rotated in a vertical direction when the stand retreats in a fixed distance; the wafer fixed by a vacuum-absorption to the tweezer is inserted into the inside of the boat; the tweezer releases the vacuum state in the boat and the wafers is transferred to the boat; and as soon as the wafer is transferred, the stand is returned to the original position and time the stepping motor returns the head to the original position at the same.