SURFACE WORKING METHOD FOR MAGNETIC DISK SUBSTRATE, MAGNETIC DISK SUBSTRATE AND SURFACE WORKING DEVICE FOR MAGNETIC DISK SUBSTRATE

摘要

PURPOSE:To provide the surface working method for the magnetic disk substrate which lessens the possibility of forming regular surface patterns in the circumferential direction of the magnetic disk at a scale larger than the sliding area of a magnetic head, has a high capacity to take air into the spacing between the magnetic head and the magnetic disk, and can form the surface patterns of the magnetic disk capable of stabilizing the gap state during traveling of the magnetic head and the magnetic disk in the state of making this gap narrower than heretofore. CONSTITUTION:This surface working method 11 for the magnetic disk substrate consists in sliding grinding media 1, 2 fixed with abrasive grains on the surfaces with the thin film supporting surface of the rotating magnetic disk substrate and forming fine linear ruggedness on the thin film supporting surface. Slurry system finishing 12 which is the post stage of sliding a slurry-like polishing material of the abrasive grains of the diameter smaller than the diameter of the abrasive grains on the thin film supporting surface by as much as the time intervals in which the ridge parts of the linear ruggedness by the abrasive grains are not completely worn by using a friction medium having the soft surface characteristic softer than the surface characteristic of the thin film supporting surface is added.