发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device capable of detecting or predicting in real time, scratch or crack during grinding; and to provide a semiconductor manufacturing device.SOLUTION: A manufacturing method of a semiconductor device in an embodiment has steps of: detecting an elastic wave generated from a workpiece during grinding of the workpiece; and detecting or predicting an abnormality of the workpiece generated during grinding by analyzing the detected elastic wave.SELECTED DRAWING: Figure 1
申请公布号 JP2016132051(A) 申请公布日期 2016.07.25
申请号 JP20150007017 申请日期 2015.01.16
申请人 TOSHIBA CORP 发明人 MATSUI YUKITERU;KAWASAKI TAKAHIKO;KAWASE AKIFUMI;SUZUKI SHUJI;MIKI TSUTOMU
分类号 B24B49/04;B24B37/30;B24B49/10;H01L21/304 主分类号 B24B49/04
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