发明名称 |
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR MANUFACTURING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device capable of detecting or predicting in real time, scratch or crack during grinding; and to provide a semiconductor manufacturing device.SOLUTION: A manufacturing method of a semiconductor device in an embodiment has steps of: detecting an elastic wave generated from a workpiece during grinding of the workpiece; and detecting or predicting an abnormality of the workpiece generated during grinding by analyzing the detected elastic wave.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016132051(A) |
申请公布日期 |
2016.07.25 |
申请号 |
JP20150007017 |
申请日期 |
2015.01.16 |
申请人 |
TOSHIBA CORP |
发明人 |
MATSUI YUKITERU;KAWASAKI TAKAHIKO;KAWASE AKIFUMI;SUZUKI SHUJI;MIKI TSUTOMU |
分类号 |
B24B49/04;B24B37/30;B24B49/10;H01L21/304 |
主分类号 |
B24B49/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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