发明名称 SOLID ELECTROLYTE MEMORY DEVICE AND FABRICATING METHOD THEREOF
摘要 <p>A solid electrolyte memory device and a manufacturing method thereof are provided to perform nonvolatile, a high speed operation, and a high integration by using a silver-antimony-tellurium alloy or a copper-antimony-tellurium alloy as a solid electrolyte. In a solid electrolyte memory device, a first electrode layer(106) is formed on a substrate(100). A solid electrolyte layer(128) made of a silver-antimony-tellurium alloy or a copper-antimony-tellurium alloy is included on the first electrode layer. A second electrode layer(132) is formed on the solid electrolyte layer. The silver-antimony-tellurium alloy is made of silver 40~90 atomic%, antimony 5~30 atomic%, and tellurium 5~30 atomic%. The copper-antimony-tellurium alloy is made of copper 40~90 atomic%, antimony 5~30 atomic%, and tellurium 5~30 atomic%.</p>
申请公布号 KR20090029155(A) 申请公布日期 2009.03.20
申请号 KR20070118530 申请日期 2007.11.20
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 PARK, YOUNG SAM;LEE, SEUNG YUN;YOON, SUNG MIN;JUNG, SOON WON;YU, BYOUNG GON
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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