| 摘要 |
PROBLEM TO BE SOLVED: To eliminate streaks and improve inscription quality by controlling that an inscription position of the permiated laser beam at the time of scanning a given block overlaps the one at the time of scanning the block adjacent to the given block. SOLUTION: On the liquid crystal mask, a block with an inscription pattern divided in a longitudinal direction is displayed in sequence and then each block is so inscribed on the work as to overlap. Thereby, a lower density part of the laser density distribution overlaps 34, and forms a profile 32 in a depth direction of the work, and at an intermediate part 33 between each blocks, the inscription is made approximately the same depth as to the other part. In the result, streaks between each blocks is eliminated. In the case that the inscription pattern is divided in a horizontal direction, the situation is the same and the shallow engraving part between each block is eliminated by inscribing each block so as to overlap on the work. |
