发明名称 PATTERN INSPECTING APPARATUS
摘要 PURPOSE:To accurately extract a truly defective pattern only, by detecting candidate defective patterns from photographed patterns to extract a defective pattern from thereamong - double inspection structure. CONSTITUTION:A substrate pattern of a printed circuit board 1a is photographed by a camera means 1b and binary-coded with a binary-coding circuit 2. A feature extraction matrix circuit 3 defines a portion to be inspected of a printed circuit board pattern within a window and extracts candidates for defective pattern comprising singular patterns, corresponding to normal patterns included in the patterns available, and defective patterns. An output data of the feature extraction matrix circuit 3 is stored in a storage circuit and the stored data is applied to a detailed pattern inspection circuit 10 to perform precision detections of the patterns. Then, a defective pattern alone is extracted.
申请公布号 JPS62119442(A) 申请公布日期 1987.05.30
申请号 JP19850260299 申请日期 1985.11.20
申请人 FUJITSU LTD 发明人 MITA KIKUO;ANDO MORITOSHI
分类号 G01N21/88;G01N21/956;H01L21/66;H05K3/00 主分类号 G01N21/88
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