| 摘要 |
A spin station of wafer cleaning equipment is provided to prevent easy uncoupling of a spindle pulley and a spindle by broadening a contact area of a pulley clamp and the crotch portion of the spindle pulley. A wafer is held and supported by a spin body. A spindle is formed under the center of the spin body, rotating the spin body. A spindle plate is formed to support the spindle, surrounding the outer circumference of the spindle. A spindle pulley receives rotational power from the outside to rotate the spindle, formed at the end of the spindle confronting the spin body. A pulley clamp(360) clamps the crotch portion of the spindle pulley in a portion most adjacent to the spindle pulley, surrounding the crotch portion of the spindle pulley extended to one side of the spindle pulley so as to fix the spindle pulley to the spindle.
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