COMBINED ELECTROSTATIC LENS SYSTEM FOR ION IMPLANTATION

摘要

A system and method are provided for implanting ions at low energies into a workpiece (109). An ion source configured to generate an ion beam is provided, wherein a mass resolving magnet (102) is configured to mass resolve the ion beam. The ion beam may be a ribbon beam or a scanned spot ion beam. A mass resolving aperture (103) positioned downstream of the mass resolving magnet filters undesirable species from the ion beam. A combined electrostatic lens (106) system is positioned downstream of the mass analyzer, wherein a path of the ion beam is deflected and contaminants are generally filtered out of the ion beam, while concurrently decelerating and parallelizing the ion beam. A workpiece scanning system is further positioned downstream of the combined electrostatic lens system, and is configured to selectively translate a workpiece in one or more directions through the ion beam, therein implanting ions into the workpiece.