发明名称 |
Method of inspecting photo-mask |
摘要 |
Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product. |
申请公布号 |
US7289657(B2) |
申请公布日期 |
2007.10.30 |
申请号 |
US20030411610 |
申请日期 |
2003.04.10 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
HOGA MORIHISA;INOMATA HIROYUKI |
分类号 |
G03F1/08;G06K9/00;G03F1/00;G03F1/84 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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