发明名称 Method of inspecting photo-mask
摘要 Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.
申请公布号 US7289657(B2) 申请公布日期 2007.10.30
申请号 US20030411610 申请日期 2003.04.10
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 HOGA MORIHISA;INOMATA HIROYUKI
分类号 G03F1/08;G06K9/00;G03F1/00;G03F1/84 主分类号 G03F1/08
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