发明名称 |
Use of hydrogen silsesquioxane resin fractions as coating materials |
摘要 |
The present invention relates to hydrogen silsesquioxane resin (H-resin) fractions derived from an extraction process using one or more fluids at, near or above their critical state. These fractions can comprise narrow molecular weight fractions with a dispersity less than about 3.0 or fractions useful for applying coatings on substrates. The invention also relates to a method of using these fractions for forming ceramic coatings on substrates.
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申请公布号 |
US5118530(A) |
申请公布日期 |
1992.06.02 |
申请号 |
US19910717294 |
申请日期 |
1991.06.17 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
HANNEMAN, LARRY F.;GENTLE, THERESA E.;SHARP, KENNETH G. |
分类号 |
C04B41/45;C08G77/12;C09D183/04;H01L21/312;H01L21/48 |
主分类号 |
C04B41/45 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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