METHOD FOR REPAIRING HALFTONE DEFECT IN BINARY MASK

摘要

PROBLEM TO BE SOLVED: To repair a halftone defect causing imperfect light shielding in a binary mask with high accuracy and excellent transfer properties.

SOLUTION: The following phenomenon is utilized; an FIB-CVD light shielding film 8 with little halo does not grow on a gallium implanted chromium film but can grow on a glass part 6 exposed by etching. Part of the halftone defect 2 in the binary mask to which the FIB-CVD light shielding film 8 is made less attachable by implantation of gallium of focused ion beams 1 is shaved up to a glass substrate by gas assisted etching. The FIB-CVD light shielding film 8 is then grown from the exposed glass part 6 to repair the halftone defect.

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