发明名称 PROCESS LIQUID SUPPLY MECHANISM, PROCESS LIQUID SUPPLY METHOD AND STORAGE MEDIUM
摘要 <p>A process liquid supply instrument is provided to control a decrease of pressure working on the chemicals supplied from a chemical tank to a supply pipe by slowly increasing the pressure of pressure gas after chemicals are supplied from the chemical tank. A DIW(deionized water) supply source is connected to a process bath through a supply pipe. A chemical tank stores chemicals and supplies the stored chemicals to the supply pipe. A pressure gas supply source is connected to the chemical tank through the pressure gas supply pipe. The pressure gas supply source supplies pressure gas to the chemical tank so that the chemicals are supplied from the chemical tank to the supply pipe. A pressure adjusting part adjusts the pressure of the pressure gas supplied from the pressure gas supply source, installed in a pressure gas supply pipe between the pressure gas supply source and the chemical tank. A control part controls the pressure adjusting part to slowly increase the pressure of the pressure gas supplied from the pressure gas supply source to the chemical tank after the chemicals are supplied from the chemical tank to the supply pipe. Based upon the interval of supply time of the chemicals from the chemical tank to the supply pipe, the control part can control the pressure adjusting part to slowly increase the pressure of the pressure gas supplied from the pressure gas supply source to the chemical tank.</p>
申请公布号 KR20070095771(A) 申请公布日期 2007.10.01
申请号 KR20070022445 申请日期 2007.03.07
申请人 TOKYO ELECTRON LIMITED 发明人 SASAKI KEISUKE;ESHIMA KAZUYOSHI
分类号 H01L21/00;H01L21/304;H01L21/3063 主分类号 H01L21/00
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