| 摘要 |
<P>PROBLEM TO BE SOLVED: To efficiently expose a plurality of regions on a substrate with corresponding patterns. <P>SOLUTION: An exposure method of exposing a plurality of different regions on a wafer W2 includes a process of holding the wafer W2 on a simple stage 13 and measuring first measurement information including position information of at least one of a direction along a surface of the wafer W2 and a normal direction on the surface, a process of exposing a non-device region on the wafer W2 based upon the first measurement information, a process of mounting the wafer 2 on a wafer stage WST, and a process of driving the wafer stage WST using the first measurement information to expose device regions on the wafer W2. <P>COPYRIGHT: (C)2009,JPO&INPIT |
