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发明名称
METHOD FOR MANUFACTURING OF MOS SEMICONDUCTOR DEVICES
摘要
申请公布号
KR920007826(B1)
申请公布日期
1992.09.17
申请号
KR19890003275
申请日期
1989.03.16
申请人
FUJI ELECTRIC CO.,LTD.
发明人
FUJIHARA, TATSUHIKO
分类号
H01L29/68;H01L21/331;H01L21/336;H01L29/10;H01L29/739;H01L29/78;(IPC1-7):H01L29/78
主分类号
H01L29/68
代理机构
代理人
主权项
地址
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