发明名称 MAINTENANCE LIQUID AND MAINTENANCE METHOD
摘要 PROBLEM TO BE SOLVED: To provide: a maintenance liquid that is excellent in replaceability of a radiation curable composition and excellent in removability of foreign matter caused due to an ingredient of the radiation curable composition; and a maintenance method.SOLUTION: A maintenance liquid is used for maintenance of an inkjet device using and discharging a radiation curable composition. The maintenance liquid contains one or more kinds of polymerizable compounds and has a moisture content of 5 mass% or less. The polymerizable compound contains at least one kind of water soluble polymerizable compound whose water solubility is not less than 1 g/100 g(20°C).SELECTED DRAWING: None
申请公布号 JP2016124212(A) 申请公布日期 2016.07.11
申请号 JP20150000160 申请日期 2015.01.05
申请人 SEIKO EPSON CORP 发明人 KIDA HIROAKI;AOYAMA TETSUYA;NAKANO KEITARO;TSUCHIYA HITOSHI;YODA TOSHIYUKI
分类号 B41J2/17;B41J2/01;C11D7/26;C11D17/08 主分类号 B41J2/17
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