发明名称 |
MAINTENANCE LIQUID AND MAINTENANCE METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide: a maintenance liquid that is excellent in replaceability of a radiation curable composition and excellent in removability of foreign matter caused due to an ingredient of the radiation curable composition; and a maintenance method.SOLUTION: A maintenance liquid is used for maintenance of an inkjet device using and discharging a radiation curable composition. The maintenance liquid contains one or more kinds of polymerizable compounds and has a moisture content of 5 mass% or less. The polymerizable compound contains at least one kind of water soluble polymerizable compound whose water solubility is not less than 1 g/100 g(20°C).SELECTED DRAWING: None |
申请公布号 |
JP2016124212(A) |
申请公布日期 |
2016.07.11 |
申请号 |
JP20150000160 |
申请日期 |
2015.01.05 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KIDA HIROAKI;AOYAMA TETSUYA;NAKANO KEITARO;TSUCHIYA HITOSHI;YODA TOSHIYUKI |
分类号 |
B41J2/17;B41J2/01;C11D7/26;C11D17/08 |
主分类号 |
B41J2/17 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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